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US 12,547,085 B2Granted
System and projection exposure apparatus
AssigneeCarl Zeiss SMT GmbH
InventorsMarwene Nefzi, Jens Kugler
Life of this patent
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Abstract
A system for a projection exposure apparatus which comprises a first component, a second component, and a decoupling device configured to decouple the second component in more than one degree of freedom from mechanical excitations of the first component. The decoupling device comprises first decoupling elements which have a positive stiffness. The decoupling device also comprises second decoupling elements, which have a negative stiffness. The decoupling device further comprises a third component, which is arranged between the first and second components.
Claims20
A system, comprising:
- a first component;
- a second component;
- and
- a decoupling device configured to decouple the second component from mechanical excitations of the first component in more than one degree of freedom,
- wherein:
- the decoupling device comprises first decoupling elements;
- each first decoupling element has a positive stiffness;
- the decoupling device comprises second decoupling elements;
- each second decoupling element has a negative stiffness;
- the decoupling device comprises a third component between the first and second components;
- and
- the decoupling device is configured to decouple the second component from mechanical excitations of the first component in six degrees of freedom.
9 more elements
Dependencies are inferred from the claim text.