Loading patent…
AssigneeASML Netherlands B.V.
InventorsJasper Frans Mathijs Van Rens, Albertus Victor Gerardus Mangnus
Estimating the term…
The present disclosure relates to an inspection tool having a charged particle source to provide a charged particle beam, a sample holder to hold a sample, and a scanning system configured to scan the charged particle beam over an area of the sample in a scanning pattern. The scanning system may comprise a microwave or RF wave supporting structure to provide a first oscillating electromagnetic field to periodically deflect the charged particle beam in order to scan the charged particle beam over the area of the sample. The charged particle beam may be an electron beam, so that the inspection tool may be a scanning electron microscope. The scanning system may be configured to continuously scan the charged particle beam over the area of the sample.
An inspection tool including:
A method of scanning a sample in an inspection tool, the method comprising:
A non-transitory computer readable medium storing a set of instructions that is executable by one or more processors of an inspection tool to cause the inspection tool to perform a method of inspecting a sample, the method comprising:
Dependencies are inferred from the claim text.