Substrate treating apparatus

A substrate treating apparatus, comprising:

• a transport chamber provided with a transport robot configured to carry in or out a substrate;
• a chamber member disposed adjacent to the transport chamber, including an accommodation space and an opening configured to move the substrate into and out of the accommodation space, wherein a vessel part having a substrate treatment region formed for treating the substrate using a supercritical fluid is installed in the accommodation space;
• a first driving part configured to move one of the upper and lower bodies of the vessel part relative to the other;
• a first exhaust part configured to discharge an internal air from the accommodation space to the outside;
• a second exhaust part disposed adjacent to the first driving part and configured to exhaust an internal air around the first driving part to the outside,
• wherein the chamber member has a first suction part formed in the shape of a penetrating hole or a slit in a position spaced apart from the opening, and
• regardless of whether the opening is opened or not, an external air introduced from the opened first suction part is discharged to the outside along with the internal air of the accommodation space through one of the first exhaust part and the second exhaust part;
• and
• a shutter configured to open or close the opening of the chamber member;
• wherein during the treatment of the substrate using the supercritical fluid in the vessel part, the shutter closes the opening.

A substrate treating apparatus, comprising:

• a transport chamber provided with a transport robot configured to carry in or out a substrate;
• a chamber member disposed adjacent to the transport chamber, including an accommodation space and an opening configured to move the substrate into and out of the accommodation space,
• a vessel part provided in the accommodation space and having a substrate treatment region formed as a supercritical treatment space by coupling an upper body and a lower body of thereof;
• a shutter configured to open or close the opening of the chamber member;
• a fluid supply unit configured to supply a treating fluid to the substrate treatment region;
• an exhaust unit configured to exhaust the treating fluid from the vessel part;
• a first exhaust part configured to discharge an internal air from the accommodation space to the outside and face the opening and the substrate treatment region at the same height;
• a first driving part configured to move one of the upper body and the lower body relative to the other body;
• a second exhaust part disposed adjacent to the first driving part and configured to exhaust the internal air around the first driving part to the outside;
• a clamping module including a clamp configured to clamp a circumference of the vessel part, and a second driving part configured to drive a clamping release and a clamping operation of the clamp;
• a third exhaust part disposed adjacent to the second driving part and configured to exhaust the internal air around the second driving part to the outside,
• wherein the chamber member comprises:
• a first suction part formed in the shape of a penetrating hole or a slit at the same height as the second exhaust part;
• and
• a second suction part formed in the shape of the penetrating hole or the slit at the same height as the third exhaust part,
• wherein the first suction part, the opening part and the second suction part are provided in a vertical line,
• the treating fluid forms a supercritical fluid in the fluid supply unit and is then supplied, or forms the supercritical fluid by controlling pressure and temperature in the substrate treatment region, and
• during the treatment of the substrate using the supercritical fluid in the vessel part, the shutter closes the opening, and an external air from the opened first and second suction parts is discharged to the outside along with the internal air of the accommodation space through one of the first exhaust part, the second exhaust part, and the third exhaust part.