In-situ solid chemical vapor deposition precursor delivery

A chemical vapor deposition system comprising:

• a reactor comprising;
• at least one wall extending between an inlet end and an outlet end;
• and
• an internal volume defined by the at least one wall, the inlet end, and the outlet end;
• a heat source in thermal communication with the internal volume;
• and
• a solid precursor container removably placed within the internal volume, wherein the solid precursor container is a tooling for at least partially enclosing a substrate, the solid precursor container comprising:
• a first plate comprising a first internal cavity configured to hold an amount of a solid precursor and a first opening fluidly connecting the first internal cavity to the internal volume of the reactor;
• and
• a second plate, wherein the first plate and the second plate are configured to at least partially enclose the substrate therebetween,
• wherein each of the first plate and the second plate further comprises a plurality of apertures extending fully through a thickness of the respective first plate and second plate, each aperture open to the internal volume at a first end and open to face the substrate at a second end opposite the first end.