Method for producing decomposing/cleaning composition
AssigneeResonac Corporation
InventorsSusumu Nakazaki, Kuniaki Miyahara
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Abstract
Provided is a method for producing a decomposing/cleaning composition which improves etching speed retention. In particular, a method for producing a decomposing/cleaning composition which contains (A) an N-substituted amide compound in which a hydrogen atom is not directly bonded to a nitrogen atom and (B) a quaternary alkyl ammonium fluoride or a hydrate thereof is provided, the method having a preparation step for mixing the (A) and (B) components in an inert gas atmosphere.
Claims18
A method for producing a decomposing cleaning composition comprising (A) an N-substituted amide compound in which no hydrogen atom is directly bonded to a nitrogen atom, and (B) a quaternary alkylammonium fluoride or a hydrate thereof, the method comprising:
- a preparation step of mixing the (A) and the (B) under an inert gas atmosphere, and
- an encapsulation step of enclosing the prepared decomposing cleaning composition in a container under an inert gas atmosphere after the preparation step.
Dependencies are inferred from the claim text.