Selective metamaterial absorber and method for fabricating the same

Abstract

A selective metamaterial absorber and method for fabricating the same is disclosed. The method includes deposing a first metal layer on a first surface of a substrate and on a plurality of nanowires extending outward from the first surface of the substrate, the plurality of nanowires forming an array on the first surface, the substrate further including a second surface opposite the first surface. The first metal layer may be deposed using conformally sputtering. The substrate and the plurality of nanowires may be composed of silicon, and the first metal layer may be composed of tungsten. The first metal layer may be composed of a material having a penetration depth for a wavelength range of interest. The first metal layer may be at least three times thicker than the penetration depth.

Dependencies are inferred from the claim text.