Back to results
US 12,543,551 B2Granted
Selective formation of conductor nanowires
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChao-Hsien Peng, Hsiang-Huan Lee, Shau-Lin Shue
Life of this patent
Estimating the term…
Abstract
A method includes etching a mandrel layer to form mandrel strips, and selectively depositing metal lines on sidewalls of the mandrel strips. During the selective deposition, top surfaces of the mandrel strips are masked by dielectric masks. The method further includes removing the mandrel layer and the dielectric masks, filling spaces between the metal lines with a dielectric material, forming via openings in the dielectric material, with top surfaces of the metal lines exposed to the via openings, and filling the via openings with a conductive material to form vias.
Claims20
An integrated circuit structure comprising:
- a first metal line, a second metal line, and a third metal line over a semiconductor substrate, the first metal line comprising a first inner sidewall and a first outer sidewall opposite the first inner sidewall, the second metal line comprising a second inner sidewall facing the first inner sidewall, the third metal line comprising a third outer sidewall facing the first outer sidewall, wherein the first inner sidewall has a constant slope from a top portion of the first inner sidewall to a bottom portion of the first inner sidewall, wherein the second inner sidewall has a constant slope from a top portion of the second inner sidewall to a bottom portion of the second inner sidewall, wherein the third outer sidewall has a constant slope from a top portion of the third outer sidewall to a bottom portion of the third outer sidewall, wherein a first distance between the top portion of the first inner sidewall and the top portion of the second inner sidewall is smaller than a second distance between the bottom portion of the first inner sidewall and the bottom portion of the second inner sidewall, wherein a third distance between a top portion of the first outer sidewall and the top portion of the third outer sidewall is larger than a fourth distance between a bottom portion of the first outer sidewall and the bottom portion of the third outer sidewall;
- a dielectric layer surrounding the first metal line and the second metal line, wherein a first portion of the dielectric layer extends continuously between the first inner sidewall and the second inner sidewall, and wherein a second portion of the dielectric layer extends continuously between the first outer sidewall and the third outer sidewall;
- and
- a first conductive via extending through the dielectric layer, wherein the first conductive via is connected to a top surface of the first metal line.
1 more element
An integrated circuit structure comprising:
- a first etch stop layer,
- a first metal line on the first etch stop layer, the first metal line having a first sidewall and a second sidewall opposite the first sidewall, wherein the first sidewall is linear from an upper surface of the first metal line to a bottom surface of the first metal line;
- a second metal line on the first etch stop layer adjacent the first metal line, the second metal line having a third sidewall and a fourth sidewall opposite the third sidewall, wherein the third sidewall is linear from an upper surface of the second metal line to a bottom surface of the second metal line, wherein the first sidewall faces the third sidewall, wherein a bottom portion of the first sidewall is spaced apart from a bottom portion of the third sidewall by a first distance, wherein a top portion of the first sidewall is spaced apart from a top portion of the third sidewall by a second distance, wherein the second distance is larger than the first distance, wherein a bottom portion of the second sidewall is spaced apart from a bottom portion of the fourth sidewall by a third distance, wherein a top portion of the second sidewall is spaced apart from a top portion of the fourth sidewall by a fourth distance, and wherein the fourth distance is larger than the third distance;
- and
- a dielectric layer surrounding the first metal line and the second metal line, wherein the dielectric layer extends along the first sidewall, the second sidewall, the third sidewall, and the fourth sidewall.
2 more elements
An integrated circuit structure comprising:
- a first metal line having a first tilted sidewall and a second tilted sidewall opposite to the first tilted sidewall, wherein the second tilted sidewall is parallel to the first tilted sidewall;
- a first conductive via in contact with a top surface of the first metal line, wherein the first tilted sidewall tilts continuously from a bottom surface of the first metal line to the top surface of the first metal line, wherein the second tilted sidewall tilts continuously from the bottom surface of the first metal line to the top surface of the first metal line;
- a second metal line having a third tilted sidewall and a fourth tilted sidewall opposite to the third tilted sidewall, wherein the third tilted sidewall is parallel to the fourth tilted sidewall;
- and
- a dielectric layer surrounding the first metal line, the second metal line, and the first conductive via.
2 more elements
Dependencies are inferred from the claim text.