Back to results
US 12,542,260 B2Granted
Surface topologies of electrostatic substrate support for particle reduction
AssigneeApplied Materials, Inc.
InventorsArvinder Manmohan Singh Chadha, Christopher Beaudry
Life of this patent
Estimating the term…
Abstract
A substrate support for use in a processing chamber to hold a substrate thereon includes a substrate support body, and a plurality of mesas on recessed surfaces of the substrate support body, wherein heights of the plurality of mesas from the recessed surfaces vary over the substrate support body between at least two different heights.
Claims17
A substrate support for use in a processing chamber, comprising:
- a substrate support body configured to hold a substrate thereon;
- and
- a plurality of mesas on recessed surfaces of the substrate support body, the plurality of mesas comprising ceramic material, wherein
- the substrate support body comprises active materials that exhibit piezo-electricity or piezo-resistivity to change heights of the plurality of mesas from the recessed surfaces to conform to the substrate.
1 more element
A substrate support for use in a processing chamber to hold a substrate thereon, comprising:
- a substrate support body;
- and
- a plurality of mesas on recessed surfaces of the substrate support body, each of the plurality of mesas having elevated elongated features with holes formed therebetween from a top surface of the elevated elongated features.
Dependencies are inferred from the claim text.