Processing apparatus, processing method and processing system
AssigneeNikon Corporation
InventorsMasayuki Shiraishi, Kenta Sudo, Yosuke Tatsuzaki, Baku Ogasawara
Life of this patent
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Abstract
A processing apparatus is a processing apparatus that irradiates a surface of an object with processing light to process an object and is provided with: a light irradiation apparatus that emits first processing light to form a first irradiation area on the surface and emits second processing light to form a second irradiation area, at least a part of which overlaps with the first irradiation area, on the surface, and has a change member that is configured to change a state of an overlap between the first and second irradiation areas.
Claims18
A processing apparatus that irradiates an object with processing light to process the object,
- the processing apparatus comprising:
- a first optical system that divides incident light into first light and second light;
- a second optical system that returns the first light, which is from the first optical system, to the first optical system as third light;
- and
- a third optical system that returns the second light, which is from the first optical system, to the first optical system as fourth light,
- the first optical system emitting the third light from the second optical system and the fourth light from the third optical system as a plurality of processing lights with which different positions on a surface of the object are irradiated, respectively.
A processing system that irradiates an object with processing light to process the object so that a pattern structure that extends in a desired direction is formed at the object,
- the processing system comprising:
- a first movable apparatus that is movable to change a relative position of an irradiation position of the processing light and a surface of the object in a first direction that is along the surface of the object;
- and
- a second movable apparatus that is heavier and/or larger than the first movable apparatus and that is movable to change the relative position of the irradiation position of the processing light and the surface of the object in a second direction that is along the surface of the object and that intersects with the first direction,
- the first and second movable apparatuses being aligned relative to the surface so that a first angle between an axis extending in the desired direction and an axis extending in the first direction is shorter than a second angle between the axis extending in the desired direction and an axis extending in the second direction.
A processing system comprising:
- a light irradiation apparatus that irradiates a surface of an object with processing light;
- and
- a position change apparatus that changes a relative position of a target irradiation area of the processing light on the surface of the object and the surface,
- the processing system alternately repeating a first operation that scans the surface with the processing light along a first axis that is along the surface and a second operation that changes a relative position of the processing light and the surface along a second axis that intersects with the first axis and that is along the surface by using the light irradiation apparatus and the position change apparatus,
- the first operation including a first scan operation that scans the surface with the processing light so that the target irradiation position relatively moves relative to the surface toward a first direction that is along the first axis and a second scan operation that scans the surface with the processing light so that the target irradiation position relatively moves relative to the surface toward a second direction that is along the first axis and that is a direction opposite to the first direction.
A processing system that irradiates a surface of an object with processing light from a light source to process the surface,
- the processing system comprising:
- a first optical system that is disposed on an optical path of the processing light from the light source;
- and
- a second optical system that is disposed on the optical path of the processing light from the light source and that condenses the processing light on the surface,
- a size of a beam cross-section at a converged position of the processing light through the first and second optical systems being larger than a size of a beam cross-section at a converged position of the processing light through the second optical system.
A processing method comprising:
- acquiring pattern information relating to a pattern structure, the pattern structure being generated from a simulation model for simulating a movable body at which the pattern structure is formed, and the pattern structure extending along an extending direction on a surface of the movable body, and
- processing the movable body by irradiating the movable body with processing light to form the pattern structure, which extends along the extending direction, based on the pattern information including information relating to the extending direction.
Dependencies are inferred from the claim text.