Batch substrate treatment apparatus
AssigneeSCREEN Holdings Co., Ltd.
InventorMitsutoshi Sasaki
Life of this patent
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AssigneeSCREEN Holdings Co., Ltd.
InventorMitsutoshi Sasaki
Estimating the term…
Substrates are immersed in a treatment fluid stored in a treatment chamber, and subjected to a surface treatment. A first lid and a second lid cover an upper opening of the treatment chamber. The first lid and the second lid each include sloped surfaces. At least a part of the first lid and the second lid is immersed in the treatment fluid. During the treatment on the substrates, a plurality of bubble supply pipes eject bubbles into the treatment fluid. The sloped surfaces formed on the first lid and the second lid guide the bubbles reaching an interface between the treatment fluid, the first lid, and the second lid diagonally upward. Thus, the bubbles are smoothly released outside the treatment chamber. This can eliminate retention of the bubbles, avoid contacts between the bubbles and the substrates, and suppress a decrease in the treatment uniformity.
A substrate treatment apparatus that subjects a substrate to a surface treatment using a treatment fluid, the apparatus comprising:
Dependencies are inferred from the claim text.