Anti-reflective hard mask composition
AssigneeChempole Co., Ltd.
InventorSangjun Choi
Life of this patent
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Abstract
An anti-reflective hard mask comprises: (a) a terpolymer in the form of a hetero aromatic represented by chemical formula 1, or a terpolymer blend comprising same; and (b) an organic solvent. wherein in the above Formula, X represents an oxygen, sulfur, or nitrogen atom, and n is 0 or 1, and Z group, as a monomer of the terpolymer, is a C6 to C40 aryl group and a heteroaryl group capable of forming a copolymer with the heteroaromatic monomer and a fluorenone derivative monomer, includes an ether bond or an amino bond, and R1 and R2 are hydrogen or a hydroxyl group, and are the same as or different from each other.
Claims10
A terpolymer represented by Chemical Formula 1 below and containing a monomer of a heteroaromatic structure,
- wherein in the above Formula, X represents an oxygen, sulfur, or nitrogen atom, and n is 0 or 1, and
- wherein Z group, as a monomer of the terpolymer, is a C6 to C40 aryl group and a heteroaryl group capable of forming a copolymer with the heteroaromatic monomer and a fluorenone derivative monomer, includes an ether bond or an amino bond, and R1 and R2 are hydrogen or a hydroxyl group, and are the same as or different from each other, where each molar ratio of the monomers of the terpolymer has a range as follows:
- o/(o+p+q)=0.1 to 0.5, p/(o+p+q)=0.4 to 0.6, q/(o+p+q)=0.01 to 0.3.
Dependencies are inferred from the claim text.