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US 12,533,726 B2Granted
Atomic layer deposition (ALD) for multi-layer ceramic capacitors (MLCCs)
AssigneeForge Nano, Inc.
InventorsDaniel Higgs, Chris Gump, Karen Buechler, Jennette Warner, Paul Nelson, David M. King, Arrelaine Dameron, James Trevey
Life of this patent
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Abstract
The use of Atomic Layer Deposition (ALD) and Molecular Layer Deposition (MLD) applied to powders and intermediates of the MLCC fabrication process can provide significant advantages. Coating metal particles within a defined range of ALD cycles is shown to provide enhanced oxidation resistance. Surprisingly, a very thin ALD layer was found to substantially increase sintering temperature.
Claims12
An intermediate structure, comprising:
- a plurality of green layers comprising metallic particles having a coating;
- wherein the coating is formed by coating the metallic particles by ALD to render the particles non-pyrophoric;
- wherein the metallic particles comprise pyrophoric Zn, Al, Cu, or Ti;
- wherein at least 90%, by number, of the coated particles have diameters in the range of 20 μm or less;
- and
- wherein the coating comprises Y2O3.
3 more elements
Dependencies are inferred from the claim text.