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US 12,532,697 B2Granted
Etching device and etching method thereof
AssigneeZeus Co., Ltd.
InventorsSeung Hoon Lee, Sung Won Mo, Yang Ho Lee, Jeong Hyun Bae, Seong Hwan Park, Hyun Dong Cho
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Abstract
The present invention relates to an etching device and an etching method thereof, the etching device comprising: an etchant supply unit for supplying an etchant to an etching chamber; a rinsing liquid supply unit for supplying a rinsing liquid to the etching chamber, a cleaning liquid supply unit for supplying a cleaning liquid to the etching chamber, and a first pressurization maintaining unit for maintaining at least one of the etching chamber and the etchant supply unit in a pressurized atmosphere.
Claims10
An etching device comprising:
- an etchant supply container configured to provide an etchant to an etching chamber in which an object is placed;
- a rinsing liquid supply container configured to provide a rinsing liquid to the etching chamber;
- a cleaning liquid supply container configured to provide a cleaning liquid to the etching chamber;
- a first pressurizer configured to maintain the etching chamber and the etchant supply container in a pressurized atmosphere;
- a pressurization storage container configured to accommodate the rinsing liquid and the cleaning liquid discharged from the etching chamber;
- a second pressurizer configured to maintain the pressurization storage container in the pressurized atmosphere;
- and
- a supply line connecting the etchant supply container to the etching chamber;
- wherein the etchant supply container includes:
- a storage chamber in which the etchant is stored;
- and
- a temperature regulator configured to maintain the etchant stored in the storage chamber at a set temperature.
9 more elements
Dependencies are inferred from the claim text.