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US 12,529,556 B2Granted
Thickness measuring device and thickness measuring method to measure thickness of substrate
AssigneeTokyo Electron Limited
InventorsTakeshi Tamura, Munehisa Kodama, Tomohiro Kaneko
Life of this patent
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Abstract
A thickness measuring device configured to measure a thickness of a substrate includes a substrate holder configured to hold the substrate; a measurer configured to measure the thickness of the substrate held by the substrate holder; and a moving mechanism configured to move the substrate holder and the measurer relatively in a horizontal direction. The substrate holder is provided with a notch portion which extends in a diametrical direction from a center of the substrate holder to an outer end thereof, and the measurer is configured to be relatively advanced into or retreated from the notch portion.
Claims11
A thickness measuring device configured to measure a thickness of a substrate, comprising:
- a substrate holder configured to hold the substrate, the substrate holder having a diameter equal to or less than a half of a diameter of the substrate;
- a measurer configured to measure the thickness of the substrate held by the substrate holder;
- a moving mechanism configured to move the substrate holder such that the substrate holder moves relatively with respect to the measurer in a horizontal direction;
- a rotating mechanism configured to rotate the substrate holder;
- and
- a controller and a storage storing a computer program, wherein the storage and the computer program are configured, with the controller, to control the substrate holder, the measurer, the moving mechanism and the rotating mechanism,
- wherein the measurer comprises:
- an upper sensor disposed above the substrate held by the substrate holder, and configured to measure a distance to a top surface of the substrate;
- and
- a lower sensor disposed below the substrate held by the substrate holder, and configured to measure a distance to a bottom surface of the substrate,
- wherein the substrate holder is provided with a notch portion which extends in a diametrical direction from a center of the substrate holder to an outer end thereof, and the lower sensor is configured to be relatively advanced into the notch portion or retreated from the notch portion, and
- wherein the controller is configured to perform:
- a control of measuring the thickness of the substrate at multiple points in the diametrical direction by using the measurer;
- a control of measuring the thickness of the substrate at a center thereof in a state that the lower sensor is advanced into the notch portion and a rotation of the substrate holder is stopped;
- and
- a control of measuring, at plural points in a circumferential direction of the substrate, the thickness of the substrate at a position located at a distance of one half of a radius from the center of the substrate in a state that the lower sensor is retreated from the notch portion and the substrate holder is rotated by the rotating mechanism.
13 more elements
A thickness measuring method of measuring a thickness of a substrate by using a thickness measuring device,
- wherein the thickness measuring device comprises:
- a substrate holder configured to hold the substrate, the substrate holder having a diameter equal to or less than a half of a diameter of the substrate;
- a measurer configured to measure the thickness of the substrate held by the substrate holder;
- and
- a moving mechanism configured to move the substrate holder such that the substrate holder moves relatively with respect to the measurer in a horizontal direction;
- and
- a rotating mechanism configured to rotate the substrate holder,
- wherein the measurer comprises:
- an upper sensor disposed above the substrate held by the substrate holder, and configured to measure a distance to a top surface of the substrate;
- and
- a lower sensor disposed below the substrate held by the substrate holder, and configured to measure a distance to a bottom surface of the substrate,
- wherein the substrate holder is provided with a notch portion which extends in a diametrical direction from a center of the substrate holder to an outer end thereof, and the lower sensor is configured to be relatively advanced into the notch portion or retreated from the notch portion, and
- wherein the thickness measuring method comprises:
- measuring the thickness of the substrate at multiple points in the diametrical direction by using the measurer;
- measuring the thickness of the substrate at a center thereof in a state that the lower sensor is advanced into the notch portion and a rotation of the substrate holder is stopped;
- and
- measuring, at plural points in a circumferential direction of the substrate, the thickness of the substrate at a position located at a distance of one half of a radius from the center of the substrate in a state that the lower sensor is retreated from the notch portion and the substrate holder is rotated by the rotating mechanism.
14 more elements
Dependencies are inferred from the claim text.