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US 12,529,149 B2Granted
Substrate processing apparatus and substrate processing method
AssigneeSemes Co., Ltd.
InventorsMin Jung Kim, Seong Soo Lee, Jun Kil Hwang
Life of this patent
Estimating the term…
Abstract
A substrate processing apparatus includes a substrate processing unit for processing a substrate by discharging a chemical liquid to the substrate; a chemical storage unit connected to the substrate processing unit by a chemical liquid supply line and a chemical liquid recovery line; and a liquid replenishment unit including an evaporation measurement member for measuring the amount of evaporation of water contained in the chemical liquid, and a water supply member for supplying water to the chemical liquid.
Claims18
A substrate processing apparatus, comprising:
- a substrate processor for processing a substrate by discharging a chemical liquid to the substrate;
- a chemical storer connected to the substrate processor by a chemical liquid supply line and a chemical liquid recovery line;
- and
- a liquid replenishment unit including:
- an evaporation measurement member for measuring the amount of evaporation of water contained in the chemical liquid,
- a water supply member for supplying water to the chemical liquid;
- and
- a controller for automatically controlling an amount of water supply of the water supply member based on the amount of evaporation of water calculated through a water level measured by the evaporation measurement member and based on a decrease rate of concentration of the chemical liquid through a mechanism of an etching reaction of the substrate.
5 more elements
A substrate processing apparatus, comprising:
- a substrate processing unit including a processing vessel having a processing space in which a substrate is treated with a chemical liquid, a support unit supporting the substrate in the processing space, and a nozzle portion discharging the chemical liquid to the substrate in the processing space;
- a chemical storage unit including a recycling tank connected to the processing container through a chemical liquid recovery line, a condition tank connected to the recycling tank through a chemical liquid recycling line, and a main tank connected to the condition tank through a chemical liquid delivery line and connected to the nozzle portion through a chemical liquid supply line;
- and
- a liquid replenishment unit including an evaporation measurement member installed in the chemical liquid storage unit and measuring an amount of evaporation of water contained in the chemical liquid, and a water supply member supplying water to the chemical liquid,
- wherein the evaporation measurement member is a level sensor installed in the recycling tank, and
- wherein the liquid replenishment unit further includes a controller for automatically controlling the amount of water supply of the water supply member based on the amount of evaporation of water calculated through the water level measured by the level sensor and based on a decrease rate of concentration of the chemical liquid through a mechanism of an etching reaction of the substrate.
3 more elements
A substrate processing method, comprising:
- supplying a chemical liquid to a nozzle portion;
- processing the substrate by discharging the chemical liquid to the substrate through the nozzle portion;
- collecting the chemical liquid after processing the substrate and storing the chemical liquid;
- and
- replenishing and supplying water to the chemical liquid based on an amount of evaporation of water of the chemical liquid,
- wherein the replenishing includes automatically controlling an amount of water supplied in the supplying based on the amount of evaporation of water calculated through a water level measured and based on a decrease rate of concentration of the chemical liquid by a mechanism of etching reaction of the substrate together with the amount of evaporation of water.
3 more elements
Dependencies are inferred from the claim text.