Substrate processing apparatus, raw material cartridge, substrate processing method, and raw material cartridge manufacturing method
AssigneeTokyo Electron Limited
InventorsMuneo Harada, Tsuneyuki Okabe
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AssigneeTokyo Electron Limited
InventorsMuneo Harada, Tsuneyuki Okabe
Estimating the term…
A substrate processing apparatus includes: a chamber; and a processing gas supply unit connected to the chamber via a processing gas supply flow path and configured to supply a processing gas. The processing gas supply unit includes a raw material cartridge that includes a raw material tank that accommodates a porous member containing a metal-organic framework adsorbed with gas molecules of a raw material of the processing gas; a main body configured to communicate the raw material tank and the processing gas supply flow path with each other when the raw material cartridge is attached; and a desorption mechanism configured to desorb the gas molecules of the raw material of the processing gas and allow the gas molecules to flow out as the processing gas to the processing gas supply flow path while the raw material cartridge is attached to the main body.
A substrate processing apparatus comprising:
A raw material cartridge installed on a substrate processing apparatus for manufacturing a semiconductor device and configured to supply a processing gas for processing the substrate, the raw material cartridge comprising:
A substrate processing method comprising:
A method of manufacturing a raw material cartridge that is installed on a substrate processing apparatus for manufacturing a semiconductor device and is configured to supply a processing gas for processing the substrate, the method comprising:
Dependencies are inferred from the claim text.