Compound, precursor compound thereof, surfactant composition, and detergent composition
AssigneeKao Corporation
InventorsAkiyoshi Kimura, Ojiro Tamagawa
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AssigneeKao Corporation
InventorsAkiyoshi Kimura, Ojiro Tamagawa
Estimating the term…
A compound is provided that exhibits high detergency even when contained at a low concentration in a detergent composition, and that has a narrow gelation concentration range at low temperatures and excellent handling properties; a precursor compound for producing the compound; and a surfactant composition and a detergent composition that include the compound. The compound of the present invention is represented by a chemical formula (1) below: wherein R1 and R2 are each an aliphatic hydrocarbon group, X is a single bond or a hydrocarbon group having 1 or more and 5 or less carbon atoms, a total number of carbon atoms of R1, R2, and X is 2 or more and 39 or less, A1 is —O(-A11O)m—H or —O(-A12O)p—H, A2 is —O—R3O(-A21O)n—H or —O(-A22O)q+1—H, wherein R3, A11, A12, A21, A22, m, n, p, q are defined in the specification.
A compound represented by a chemical formula (1) below:
Dependencies are inferred from the claim text.