Plasma processing apparatus and storage medium
AssigneeTokyo Electron Limited
InventorYusuke Aoki
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AssigneeTokyo Electron Limited
InventorYusuke Aoki
Estimating the term…
A plasma processing apparatus includes an electrostatic chuck that adsorbs a substrate, a relay circuit that turns ON and OFF the supply of voltage to the electrostatic electrode, a plasma generator, and a controller. The controller (a) controls the DC power supply to supply the voltage to the electrostatic electrode, thereby adsorbing the substrate to the electrostatic chuck, (b) controls the relay circuit to turn OFF the supply of the voltage to the electrostatic electrode, thereby bringing the electrostatic electrode into a floating state, (c) controls the plasma generator to start a plasma processing of the substrate, (d) controls the relay circuit to turn ON the supply of the voltage to the electrostatic electrode, thereby acquiring current flowing through the power supply line, and (e) determines an adsorbed state of the substrate based on the current.
A plasma processing apparatus comprising:
A non-transitory computer-readable storage medium having stored therein a program to be executed by an information processing device that controls a plasma processing apparatus including:
Dependencies are inferred from the claim text.