Photosensitive composition
AssigneeSumitomo Chemical Company, Limited
InventorsTomohiro Fukuura, Yoshihiro Harada, Yoshifumi Komatsu, Masayoshi Tokuda
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AssigneeSumitomo Chemical Company, Limited
InventorsTomohiro Fukuura, Yoshihiro Harada, Yoshifumi Komatsu, Masayoshi Tokuda
Estimating the term…
The photosensitive composition according to the present invention is a photosensitive composition including a semiconductor particle (A), a photopolymerizable compound (C) and a photopolymerization initiator (D), in which the photosensitive composition satisfies any one or more of the following (a) to (c): (a) the photosensitive composition further includes a stabilizer (E), and a content of the stabilizer (E) is 8% by mass or more based on the total amount of the photosensitive composition; (b) the photopolymerizable compound (C) includes a (meth)acrylate compound (C1) having a molecular weight of 180 or less; and (c) the photopolymerizable compound (C) includes a compound (C2) having a vinyl ether group and a (meth)acryloyl group in the same molecule.
A photosensitive composition comprising a semiconductor particle (A), a photopolymerizable compound (C), a photopolymerization initiator (D) and a solvent (F), wherein
Dependencies are inferred from the claim text.