Liquid supply unit, and substrate treating apparatus including the same
AssigneeSemes Co., Ltd.
InventorsJun Ho Song, Min Hee Cho, Won Young Kang
Life of this patent
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AssigneeSemes Co., Ltd.
InventorsJun Ho Song, Min Hee Cho, Won Young Kang
Estimating the term…
Provided is a liquid supply unit for supplying a treatment liquid to a nozzle that discharges the treatment liquid to a substrate, the liquid supply unit including: a tank for storing the treatment liquid; a main circulation line for supplying the treatment liquid from an internal space of the tank to the nozzle or for recovering the treatment liquid to the internal space of the tank; a supply line connected to the main circulation line to supply the treatment liquid to the nozzle; and a heater module installed in the main circulation line and heating the treatment liquid flowing through the main circulation line to a predetermined temperature, in which the heater module includes: a pipe in which the treatment liquid flows and which is made of a quartz material; and a heating element provided on a surface of the pipe.
An apparatus for treating a substrate, the apparatus comprising:
A liquid supply unit for supplying a treatment liquid to a nozzle that discharges the treatment liquid to a substrate, the liquid supply unit comprising:
An apparatus for treating a substrate, the apparatus comprising:
Dependencies are inferred from the claim text.