Method and system for manufacturing integrated circuit device
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChien Yao Huang, Wun-Jie Lin, Kuo-Ji Chen
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChien Yao Huang, Wun-Jie Lin, Kuo-Ji Chen
Estimating the term…
A method includes forming, over a substrate, a plurality of well taps arranged at intervals in a first direction and a second direction transverse to the first direction. The plurality of well taps is arranged at intervals in a first direction and a second direction transverse to the first direction. The plurality of well taps includes at least one first well tap. The forming the plurality of well taps comprises forming the first well tap by forming a first well region of a first type. The first well region comprises two first end areas and a first middle area arranged consecutively between the two first end areas in the second direction. The forming the first well tap further comprises implanting, in the first middle area, a first dopant of a first type, and implanting, in the first end areas, a second dopant of a second type different from the first type.
A method, comprising:
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Dependencies are inferred from the claim text.