US 12,517,433 B2Granted

Composition, resist underlayer film, method of forming film, method of producing patterned substrate, and compound

AssigneeJsr Corporation

InventorsNaoya Nosaka, Tsubasa Abe, Masato Dobashi, Kazunori Takanashi

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Abstract

A composition includes: a compound including an aromatic hydrocarbon ring structure, and a partial structure represented by formula (1) which bonds to the aromatic hydrocarbon ring structure; and a solvent. The aromatic hydrocarbon ring structure has no fewer than 25 carbon atoms. In the formula (1), X represents a group represented by formula (i), (ii), (iii), or (iv); and *'s denote binding sites to two adjacent carbon atoms constituting the aromatic hydrocarbon ring structure. A method of producing a patterned substrate, includes applying the composition directly or indirectly on a substrate to form a resist underlayer film; forming a resist pattern directly or indirectly on the resist underlayer film; and carrying out etching using the resist pattern as a mask.

Claims12

Dependent claims

A method of producing a patterned substrate, the method comprising:

applying a resist-underlayer-film-forming composition directly or indirectly on a substrate to form a resist underlayer film;
forming a resist pattern directly or indirectly on the resist underlayer film;
and
etching the substrate and the resist underlayer film using the resist pattern as a mask, wherein
the resist-underlayer-film-forming composition comprises:
a compound represented by at least one formula selected from the group consisting of formula (A1-1), formula (A1-2), formula (A1-3), formula (A1-4), formula (A1-5), formula (A1-6), formula (A1-7), and formula (A1-8);
and
a solvent, wherein
wherein, in the formulae (A1-1) to (A1-8), X represents a group represented by formula (i), (ii), (iii), or (iv),
wherein,
in the formula (i), R1 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms;
and R2 represents a monovalent organic group having 1 to 20 carbon atoms,
in the formula (ii), R3 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms;
and R4 represents a monovalent organic group having 1 to 20 carbon atoms,
in the formula (iii), R5 represents a monovalent organic group having 1 to 20 carbon atoms,
in the formula (iv), R6 represents a monovalent organic group having 1 to 20 carbon atoms, and
the monovalent organic group having 1 to 20 carbon atoms represented by R1, R2, R3, R4, R5, or R6 is represented by at least one formula selected from the group consisting of formula (x-1), formula (x-2), formula (x-3), formula (x-4), formula (x-5), formula (x-6), formula (x-7), formula (x-8), formula (x-9), formula (x-10), formula (x-11), and formula (x-12):
wherein ** denotes a site of bonding to the carbon atom or the nitrogen atom in the formula (i), (ii), (iii), or (iv).

15 more elements

Dependencies are inferred from the claim text.

Facts

Application: 17/689,193Filed 8 Mar 2022 · continuation
Priority: JP 2019-16852917 Sep 2019
Published: US 2022/0197144 A123 Jun 2022
Granted: 6 Jan 2026
Term ends: Not estimatedThe source records don’t support an estimate.

Classification17 codes

G03F 7/11
Characterised by structural details, e.g. supports, auxiliary layers: having cover layers or intermediate layers, e.g. subbing layers
C07C 13/567
At least one ring not being six-membered, the other rings being at the most six-membered: with a fluorene or hydrogenated fluorene ring system
C07C 13/62
With condensed rings: with more than three condensed rings
C07C 13/66
With more than three condensed rings: the condensed ring system contains only four rings