Radiation-sensitive resin composition and method for forming pattern
AssigneeJsr Corporation
InventorsRyuichi Nemoto, Kensuke Miyao
Life of this patent
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AssigneeJsr Corporation
InventorsRyuichi Nemoto, Kensuke Miyao
Estimating the term…
A radiation-sensitive resin composition includes a solvent and an onium salt compound having a structure represented by formula (1). Rf1 and Rf2 each independently represent a fluorine atom or a monovalent fluorinated hydrocarbon group having 1 to 20 carbon atoms. R1 represents a hydrogen atom, a monovalent hydrocarbon group having 1 to 20 carbon atoms, a fluorine atom, or a monovalent fluorinated hydrocarbon group having 1 to 20 carbon atoms. R2, R3, R4, R5, R6, and R7 each independently represent a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms. n1+n2 is an integer of 2 to 8. n3 represents an integer of 0 to 5. X1 and X2 each independently represent an oxygen atom or a sulfur atom. Each * represents a bond with another structure. Z+ represents a monovalent radiation-sensitive onium cation.
A radiation-sensitive resin composition comprising:
A radiation-sensitive resin composition comprising:
Dependencies are inferred from the claim text.