Single crystal YIG nanofilm fabricated by a metal organic decomposition epitaxial growth process
AssigneeVida Products
InventorsAllen Sweet, Szu-Fan Wang, Kai Chorazewicz
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AssigneeVida Products
InventorsAllen Sweet, Szu-Fan Wang, Kai Chorazewicz
Estimating the term…
A MOD YIG epitaxial process for fabricating YIG nanofilms which, when deposited on GGG substrates, have single crystal epitaxial properties. The films may have thicknesses of 50 nm for a single layer, 100 nm for two layers, and 130 nm for three layers, and have a gyromagnetic ratio of 2.80 MHz per Oe, Gilbert damping ranges from 0.0003 to 0.001, 4πM$ values between 1650 G to 1780 G, coercivity from 1 Oe. to 5 Oe, and surface roughness of RMS 0.20 nm for up to 10 layers. Fabrication is economical and uses only a spinner, a drying station (RT to 150 C temperature control), and a quartz tube furnace that accommodates a flowing atmosphere of research grade oxygen, thereby eliminating the need for high vacuum deposition chambers.
A metallic organic decomposition (MOD) epitaxial growth process for making a Y3Fe5O12 (YIG) nanofilm having at least one layer, the method comprising the steps of:
The YIG nanofilm of 1, wherein the in-plane ferromagnetic saturation magnetization of the YIG nanofilm is within the range of 1600 gauss to 1800 gauss.
A metallic organic decomposition (MOD) epitaxial growth process for making a Y3Fe5O12 (YIG) nanofilm, the method comprising the steps of:
A metallic organic decomposition (MOD) epitaxial growth process for making a Y3Fe5O12 (YIG) nanofilm, the method comprising the steps of:
Dependencies are inferred from the claim text.