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US 12,515,964 B2Granted
Tin oxide forming composition
AssigneeLG Chem, Ltd.
InventorsJung Ho Choi, In Sung Hwang, Hun Min Park, Dong Chul Lee, Gyo Hyun Hwang, Kwang Hyun Kim, Jung Up Bang
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Abstract
The present invention provides a tin oxide forming composition and a tin oxide forming method using the tin oxide forming composition. The tin oxide forming composition of the present invention is easy to manufacture and is capable of forming a tin oxide with a high yield.
Claims7
A composition for an electrode in a chlor-alkali process, wherein the composition comprises:
- a tin precursor;
- a platinum group precursor;
- sulfate ions;
- and
- a solvent,
- wherein a molar ratio of sulfate ions to tin (sulfate ions/tin) is 3 to 10,
- wherein a concentration of the sulfate ions in the composition is 0.01 M to 10 M,
- wherein a concentration of tin ions in the composition is 0.01 M to 10 M, and
- wherein the platinum group precursor is at least one compound selected from the group consisting of ruthenium hexafluoride (RuF6), ruthenium (III) chloride (RuCl3), ruthenium (III) chloride hydrate (RuCl3·XH2O), ruthenium (III) nitrosyl chloride (Ru(NO)Cl3), hexaammine ruthenium (III) Chloride (Ru(NH3)6Cl3), ruthenium (III) bromide (RuBr3), ruthenium (III) bromide hydrate (RuBr3·xH2O), ruthenium iodide (RuI3), ruthenium acetate, iridium chloride hydrate (IrCl3·xH2O), and hydrogen hexachloroiridate hexahydrate (H2IrCl6·6H2O).
6 more elements
Dependencies are inferred from the claim text.