Vacuum generation process for deposition of biomedical implant materials

A system for processing waste from a chemical vapor deposition process, the system comprising:

• a plurality of chemical vapor deposition systems;
• a chemical vapor deposition manifold for receiving an effluent comprising one or more waste gases from the plurality of chemical vapor deposition systems;
• a controlling valve coupled to the chemical vapor deposition manifold to regulate a flow of the one or more waste gases into the system;
• a plurality of vacuum systems in fluid communication with the chemical vapor deposition manifold, the vacuum system configured for maintaining a vacuum of at least about 0.5 Torr to about 3.5 Torr and actuatable for removing the one or more waste gases from the plurality of chemical vapor deposition systems;
• a fluid line, wherein the plurality of vacuum systems being in fluid communication with the chemical vapor deposition manifold comprises the fluid line fluidly connecting the chemical vapor deposition manifold to the plurality of vacuum systems;
• and
• a controller in communication with the plurality of vacuum systems, the controller configured to:
• receive, a signal from a pressure transducer, the signal indicative of a pressure of the one or more waste gases;
• and
• control, based on the pressure of the one or more waste gases, (i) the vacuum system to regulate the vacuum, and (ii) the controlling valve to regulate the flow of effluent into the system, to maintain a consistent vacuum level in the plurality of chemical vapor deposition systems.