Method for fabricating a photodiode structure and photodiode structure
AssigneeLynred
InventorsNicolas Pere-Laperne, Alexandre Kerlain, Vincent Destefanis, Paul Fougeres
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AssigneeLynred
InventorsNicolas Pere-Laperne, Alexandre Kerlain, Vincent Destefanis, Paul Fougeres
Estimating the term…
A substrate to fabricate a photodiode structure has a top layer made from cadmium-doped semiconductor material. A first HgCdTe-base layer is formed by liquid phase epitaxy from the top layer with a bath containing an n-type electrically active dopant to electrically dope the first layer. The cadmium diffuses from the top layer to the first layer to form a decreasing cadmium concentration gradient from the interface with the top layer in a direction away from the interface. The cadmium concentration gradient causes a decreasing band gap width gradient in the first layer from the interface and causes an n-type dopant concentration gradient in the first layer from the interface.
Photodiode structure comprising a junction designed to transform an infrared electromagnetic radiation into electron-hole pairs, the junction comprising a first layer made from HgCdTe or one of its at least quaternary derivatives of a first conductivity type and a second layer made from HgCdTe or one of its at least quaternary derivatives of a second conductivity type opposite from the first conductivity type to form a p-n or p-i-n junction;
Dependencies are inferred from the claim text.