An active gas generation apparatus activating material gas supplied to a discharge space to generate active gas, comprising:
- an electrode unit;
- and
- a chassis housing the electrode unit in a chassis space and having conductivity, wherein
- the chassis includes a chassis bottom part including a flat surface and a conductor housing space concaved from the flat surface in a depth direction,
- the electrode unit includes:
- a first electrode constituting part;
- a second electrode constituting part provided on a lower side of the first electrode constituting part;
- and
- a reference potential conductor provided on a lower side of the second electrode constituting part and housed in the conductor housing space,
- the first electrode constituting part includes a first electrode dielectric film and a first electrode conductive film formed on an upper surface of the first electrode dielectric film,
- the second electrode constituting part includes a second electrode dielectric film and a second electrode conductive film formed on a lower surface of the second electrode dielectric film,
- the reference potential conductor includes an active gas buffer space on an upper portion, and the second electrode constituting part is disposed to cover the active gas buffer space,
- the second electrode dielectric film includes a dielectric through port passing through the second electrode dielectric film in a region overlapped with the active gas buffer space in a plan view, the second electrode conductive film includes a conductive film opening part in a region overlapped with the active gas buffer space in a plan view, and the conductive film opening part is overlapped with the dielectric through port in a plan view,
- the chassis bottom part includes a gas flow path receiving material gas from an outer portion,
- a material gas flow space is provided between the reference potential conductor and the conductor housing space of the chassis,
- a space where the first electrode dielectric film and the second electrode dielectric film face each other is defined as a main dielectric space,
- the discharge space includes a main discharge space as a region in which the first and second electrode conductive films are overlapped with each other in a plan view in the main dielectric space,
- material gas is introduced into the discharge space via the gas flow path and the material gas flow space,
- alternating-current voltage is applied to the first electrode conductive film, and the second electrode conductive film is set to have reference potential via the chassis and the reference potential conductor,
- the active gas generation apparatus further includes:
- a dielectric film support member provided on the flat surface of the chassis and including a support surface supporting the first electrode dielectric film from a lower side;
- and
- a dielectric film suppression member for suppressing the first electrode dielectric film from an upper side, the dielectric film suppression member not being overlapped with the first electrode conductive film in a plan view,
- a lower surface of the dielectric film suppression member includes a dielectric contact region having contact with an upper surface of the first electrode dielectric film and a dielectric non-contact region not having contact with an upper surface of the first electrode dielectric film, the dielectric contact region is overlapped with a peripheral region of the first electrode dielectric film and the support surface of the dielectric film support member in a plan view, the dielectric non-contact region is overlapped with an intermediate region of the first electrode dielectric film in a plan view, and the intermediate region is a region adjacent to a side of the first electrode conductive film from the peripheral region,
- the dielectric film suppression member has conductivity and is set to have the reference potential, and
- the first electrode dielectric film is suppressed by the dielectric film suppression member from an upper side in the dielectric contact region.