Substrate processing apparatus and substrate processing method

A substrate processing apparatus comprising:

• a substrate transfer chamber having a floor provided with a first magnet therein;
• a substrate transfer module comprising a placing surface on which a substrate is placed and a second magnet having a repulsive force with respect to the first magnet, the substrate transfer module being configured to be movable in the substrate transfer chamber by magnetic levitation using the repulsive force;
• and
• a substrate processing chamber disposed on an upper surface side of the substrate transfer chamber to process the substrate and having an opening having a size that allows at least a part of the substrate transfer module on which the substrate is placed to pass therethrough, the opening being open toward the inside of the substrate transfer chamber,
• wherein the substrate is processed in a state where the opening is closed while the substrate transfer module on which the substrate is placed is inserted into the substrate processing chamber through the opening by raising the substrate transfer module, and
• wherein the substrate transfer module is placed on the upper surface side of the substrate transfer chamber.

A substrate processing method comprising,

• transferring a substrate placed on a stage using a substrate transfer module accommodated in a substrate transfer chamber having a floor provided with a first magnet, the substrate transfer module comprising the stage on which the substrate is placed, a traveling plate disposed below the stage, and a second magnet having a repulsive force with respect to the first magnet, and the substrate transfer module being configured to be movable in the substrate transfer chamber by magnetic levitation using the repulsive force;
• subsequently inserting the stage on which the substrate is placed into a substrate processing chamber through an opening by raising the substrate transfer module toward the substrate processing chamber, the substrate processing chamber provided on an upper surface side of the substrate transfer chamber to process the substrate, the substrate processing chamber including the opening that opens toward the inside of the substrate transfer chamber, and closing the opening by the traveling plate;
• and
• subsequently processing the substrate in the substrate processing chamber.