Apparatus for inspecting surface of object
AssigneeSamsung Electronics Co., Ltd.
InventorsYasuhiro Hidaka, Ingi Kim
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AssigneeSamsung Electronics Co., Ltd.
InventorsYasuhiro Hidaka, Ingi Kim
Estimating the term…
In semiconductor inspection using second-harmonic generation within an object, a weak second-harmonic is detected at high sensitivity. In a semiconductor inspecting apparatus which irradiates a pulsed laser with a very short pulse width to a surface of a semiconductor device as the object, and measures the second-harmonic generated within the semiconductor device, a second-harmonic generation element is disposed between a light source and the object to generate a first second-harmonic. Further, the apparatus modulates a phase of only the first second-harmonic using an electric optical crystal, and then, a fundamental wave is irradiated onto the object. When the fundamental wave is irradiated onto the semiconductor device, the second-harmonic is generated therefrom. The first second-harmonic interferes with the second second-harmonic on a detector, and an intensity of the light obtained by the interfering is modulated at the same period as that of the phase modulation of the first second-harmonic. An amplitude of the second second-harmonic may be obtained from a modulated amplitude thereof, and a phase of the second second-harmonic may be measured from a modulated phase thereof.
An apparatus for inspecting a surface of an object, the apparatus comprising:
An apparatus for inspecting a surface of an object, the apparatus comprising:
An apparatus for inspecting a surface of an object, the apparatus comprising:
Dependencies are inferred from the claim text.