Purification method of high purity isopropyl alcohol used in semiconductor cleaning process
AssigneeJaewon Industrial Co., Ltd
InventorsSung Won Shim, Byung Ki Son, Yung Lim, Hwan Choi, Youn Soo Shin, Min Young Kim, Tae Gi Choi
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Abstract
In a method for purifying highly pure isopropyl alcohol used in a semiconductor cleaning process, diacetone alcohol present in isopropyl alcohol is removed by an adsorption process, and diacetone alcohol, triisopropyl borate, and metal impurities are removed by a distillation process. The purified isopropyl alcohol may have a purity of has the moisture of 10 ppm or less, the triisopropyl boron compound of 50 ppt or less, and each metal of the metal impurities of 20 ppt or less.
Claims8
A method for purifying isopropyl alcohol from an industrial isopropyl alcohol in a liquid state having impurities including diacetone alcohol, triisopropyl borate, metal and water, the method comprising:
- removing the diacetone alcohol existing in the industrial isopropyl alcohol through an adsorption process;
- and
- performing a distillation process to reduce a level of the triisopropyl borate and the metal in the industrial isopropyl alcohol after removing the diacetone alcohol;
- removing diacetone alcohol by-produced during the distillation process to obtain a purified isopropyl alcohol having a purity of 99.999 wt % or more.
Dependencies are inferred from the claim text.