Loading patent…
AssigneeTokuyama Corporation
InventorsYuki Kikkawa, Tomoaki Sato, Takafumi Shimoda, Takayuki Negishi
Estimating the term…
A treatment liquid for a semiconductor containing a group 6 metal, the treatment liquid containing hypobromite ions. Also provided is a treatment liquid for a semiconductor containing a group 6 metal, the treatment liquid characterized by being formed by adding and mixing at least a bromine-containing compound, an oxidizing agent, a base compound, and water, wherein relative to a total mass, an added amount of the bromine-containing compound is 0.008 mass % or more and less than 10 mass % as an amount of bromine element, and an added amount of the oxidizing agent is 0.1 mass ppm or more and 20 mass % or less; and pH at 25° C. is 8 or higher and 14 or lower. Further provided is a method for producing the treatment liquid for a semiconductor.
A treatment liquid for a semiconductor of a group 6 metal, the treatment liquid comprising hypobromite ions and chloride ions, and a ratio of the hypobromite ions to the chloride ions is 0.05 or more and 0.5 or less.
A treatment liquid for a semiconductor containing a group 6 metal, the treatment liquid containing at least a bromine-containing compound, an oxidizing agent, a base compound, and water, wherein,
Dependencies are inferred from the claim text.