Substrate processing method
AssigneeSCREEN Holdings Co., Ltd.
InventorsYuji Tanaka, Masaya Asai, Masahiko Harumoto, Koji Kaneyama
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Abstract
A coating liquid containing metal as a metal-containing coating liquid is supplied to a surface to be processed of a substrate by a coating processing unit, whereby a metal-containing coating film is formed on the surface to be processed. The substrate on which the metal-containing coating film has been formed is transported to a metal removal unit by a transport mechanism. A removal liquid for dissolving the metal is supplied to a peripheral portion of the substrate by the metal removal unit such that the metal-containing coating film remains in a region except for the peripheral portion of the surface to be processed of the substrate.
Claims11
A substrate processing method including the steps of:
- forming a metal-containing coating film on a surface to be processed by supplying a coating liquid containing metal as a metal-containing coating liquid to the surface to be processed of a substrate by a film formation unit;
- transporting the substrate on which the metal-containing coating film has been formed to a peripheral portion removal unit by a transport mechanism;
- and
- supplying a first removal liquid for dissolving the metal to a peripheral portion of the substrate by the peripheral portion removal unit such that the metal-containing coating film remains in a region except for the peripheral portion of the surface to be processed of the substrate,
- wherein the first removal liquid includes an aqueous solution containing tetra methyl ammonium hydroxide or an aqueous solution containing a chelate agent.
The substrate processing method according to claim, 7, wherein
- the development nozzle and the first removal liquid nozzle are constituted by a common nozzle.
A substrate processing method including the steps of:
- holding and rotating a substrate in a horizontal attitude by a first rotation holder of a film formation unit;
- discharging a coating liquid containing metal as a metal-containing coating liquid to a surface to be processed of the substrate rotated by the first rotation holder using a coating liquid nozzle of the film formation unit to form a metal-containing coating film on the surface to be processed;
- discharging a second removal liquid for dissolving the coating liquid to a peripheral portion of the surface to be processed of the substrate rotated by the first rotation holder from a second removal liquid nozzle of the film formation unit;
- transporting the substrate to a peripheral portion removal unit from the film formation unit by a transport mechanism after the coating liquid of the peripheral portion of the surface to be processed of the substrate is dissolved by the second removal liquid;
- holding and rotating the substrate in a horizontal attitude by a second rotation holder of the peripheral portion removal unit;
- and
- discharging a first removal liquid for dissolving the metal to the peripheral portion of the surface to be processed of the substrate rotated by the second rotation holder from a first removal liquid nozzle of the peripheral portion removal unit such that the metal-containing coating film remains in a region except for the peripheral portion of the surface to be processed of the substrate.
Dependencies are inferred from the claim text.