Work function metal gate device
AssigneeUnited Microelectronics Corp.
InventorsChih-Wen Huang, Shih-An Huang
Life of this patent
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Abstract
A work function metal gate device includes a gate, a drift region, a source, a drain and a first isolation structure. The gate includes a convex stair-shaped work function metal stack or a concave stair-shaped work function metal stack disposed on a substrate. The drift region is disposed in the substrate below a part of the gate. The source is located in the substrate and the drain is located in the drift region beside the gate. The first isolation structure is disposed in the drift region between the gate and the drain.
Claims19
A work function metal gate device, comprising:
- a gate comprising a concave stair-shaped work function metal stack disposed on a substrate, wherein the concave stair-shaped work function metal stack has a symmetrical cross-sectional profile;
- a drift region located in the substrate below a part of the gate;
- a source located in the substrate and a drain located in the drift region beside the gate;
- and
- a first isolation structure disposed in the drift region between the gate and the drain.
A work function metal gate device, comprising:
- a gate comprising a concave stair-shaped work function metal stack disposed on a substrate, wherein the concave stair-shaped work function metal stack comprises a first stair-shaped work function metal stack and a second stair-shaped work function metal stack conformally covering the first stair-shaped work function metal stack;
- a drift region located in the substrate below a part of the gate;
- a source located in the substrate and a drain located in the drift region beside the gate;
- and
- a first isolation structure disposed in the drift region between the gate and the drain.
Dependencies are inferred from the claim text.