EELS auto-alignment using full image simulation
AssigneeFEI Company
InventorsPeter Christiaan Tiemeijer, Alexander Henstra
Life of this patent
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Abstract
Methods and systems for automatically tuning an EELS spectrometer according to the present disclosure include obtaining an initial measurement of an EELS spectrum, generating an simulated EELS spectrum fit to the initial measurement of the EELS spectrum, and estimating one or more values of one or more aberration parameters based on the simulated EELS spectrum. Then, using the value(s) of the aberration parameter(s) to tune the optical elements of the EELS spectrometer to remove and/or reduce aberrations in the EELS system.
Claims20
Non-transitory computer readable media comprising instructions, that when executed on one or more processors of a system, the one or more processors cause the performance of a method for automatically tuning an EELS spectrometer, the method comprising the steps of:
- obtaining an initial measurement of an EELS spectrum;
- generating a simulated EELS spectrum fit to the initial measurement of the EELS spectrum;
- estimating a value of an aberration parameter based on the simulated EELS spectrum;
- and
- tuning the EELS spectrometer based on the value of the aberration parameter.
A charged particle system for investigating a sample, the system comprising:
- a sample holder configured to hold a sample;
- an electron source configured to emit a beam of electrons towards the sample;
- an optical column configured to cause the beam of electrons to be incident on the sample;
- an EELS spectrometer configured to correct for aberrations;
- one or more detectors configured to detect electrons of the electron beam and/or emissions resultant from the electron beam being incident on the sample, the one or more detectors comprising at least an EELS detector;
- one or more processors;
- and
- a memory storing computer readable instructions that, when executed by the one or more processors, cause the system to perform the method comprising:
- obtaining an initial measurement of an EELS spectrum;
- generating a simulated EELS spectrum fit to the initial measurement of the EELS spectrum;
- estimating a value of an aberration parameter based on the simulated EELS spectrum;
- and
- tuning the EELS spectrometer based on the value of the aberration parameter.
Dependencies are inferred from the claim text.