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US 12,504,642 B2Granted
Systems and methods for fabricating microstructures
AssigneeMicroTau IP Pty Lted
InventorsHenry Claudius Bilinsky, Joseph Builth-Williams, John Whitelock-Jones, Mitchell Quinn
Life of this patent
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Abstract
Methods for forming microstructures in photocurable material are described. At least one image of light or radiation for curing the photocurable material is applied in a pattern corresponding to the image. The image is formed by near-field diffraction of the light or radiation and comprises areas of higher intensity adjacent to areas of lower intensity.
Claims20
A method for forming microstructures, comprising:
- applying, to a photocurable material, at least one image of light or radiation for curing the photocurable material in a pattern corresponding to the image, wherein each image is formed by near-field diffraction of the light or radiation through at least one photomask and comprises areas of higher intensity adjacent to areas of lower intensity;
- and
- maintaining or substantially maintaining each image during the applying for a duration sufficient to effect curing of the photocurable material, the curing forming microstructures within the photocurable material;
- wherein the at least one image of light or radiation comprises a first image and a second image, and the first and second images are interleaved in which areas of higher intensity of the first image are applied in locations of lower intensity for the second image;
- and wherein an operating distance between the at least one photomask and the photocurable material remains substantially constant during the applying step.
2 more elements
Dependencies are inferred from the claim text.