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US 12,503,800 B2Granted
Fabric processing device
AssigneeSeiko Epson Corporation
InventorsHirokazu Sekino, Osamu Katsuda
Life of this patent
Estimating the term…
Abstract
A fabric processing device includes a transport unit configured to transport a fabric in a transport direction; a support unit configured to support the fabric; a liquid ejecting unit configured to eject a liquid onto the fabric supported by the support unit; and an adjusting unit configured to adjust the liquid ejected as a continuous flow from the liquid ejecting unit to collide with the fabric in a state of being liquid droplets. The fabric processing device having such a configuration can effectively improve texture of the fabric.
Claims13
A fabric processing device comprising:
- a transport unit configured to transport a fabric in a transport direction;
- a support unit configured to support the fabric;
- a liquid ejecting unit configured to eject a liquid onto the fabric supported by the support unit;
- an adjusting unit configured to adjust the liquid ejected as a continuous flow from the liquid ejecting unit to collide with the fabric in a state of being liquid droplets;
- and
- a holding unit configured to hold the liquid electing unit, wherein
- the adjusting unit is an interval adjusting unit configured to adjust an interval between the liquid electing unit and the fabric such that the liquid collides with the fabric in the state of being the liquid droplets,
- the interval adjusting unit is coupled to the holding unit,
- the interval adjusting unit includes a fixed unit and a movable unit whose position in an interval direction between the liquid ejecting unit and the fabric can be changed with respect to the fixed unit, and
- the holding unit is coupled to the movable unit.
7 more elements
Dependencies are inferred from the claim text.