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US 12,503,758 B2Granted
Method and apparatus for processing thin films on substrates
AssigneeComptek Solutions Oy
InventorsVicente Calvo Alonso, Jouko Lång
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Abstract
The processing of the surface of a substrate to grow a high-quality thin film layer with Atomic Layer Deposition (ALD) includes first preparing the substrate surface and then creating an improved interface layer on the surface of the substrate prior the ALD growth. These processes are achieved within a single processing equipment.
Claims10
A method for processing a surface of a substrate, the method being carried out in an apparatus with a single processing chamber in which all processing steps take place, the method comprising the following processing steps:
- a preparation step comprising treating a surface of the substrate to reduce contamination, carbon, hydrocarbons, water, and/or amorphous native oxides from the surface of the substrate;
- a surface passivation step comprising an oxidation process configured to generate long-range ordered oxides on the surface of the substrate, wherein the long-range-ordered oxides are crystalline structures and exhibit translational symmetry similar or different compared to the substrate;
- an ALD growth step comprising growing a thin film by atomic layer deposition;
- wherein the single processing chamber comprises at least a substrate holding mechanism, a substrate heating element, a pumping system to provide the vacuum and regulate the pressure of the processing chamber and provide the exhaust system of gases and precursors during the processing steps, a chamber wall temperature regulation system, a gas delivery system, and a precursor delivery system.
1 more element
Dependencies are inferred from the claim text.