Method for altering adhesion properties of a surface by plasma coating
AssigneeMolecular Plasma Group SA
InventorsGill Scheltjens, Joanna Borek-Donten, Régis Heyberger
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Abstract
A method for altering adhesion properties of a surface of a substrate by a coating, comprising the steps of: a) ionizing a plasma gas at low temperature and at atmospheric pressure, thereby creating a plasma with a plasma temperature of at most 50° C.; b) introducing a precursor into a plasma gas afterglow of the plasma; c) subjecting the surface of the substrate to the plasma including the precursor, thereby forming a coating onto the surface. The plasma gas is essentially completely comprised of inert gas. The coating alters the adhesion properties of the surface.
Claims14
A method for altering adhesion properties of a surface of a substrate with respect to a second surface by a coating, comprising the steps of:
- a) ionizing a plasma gas at low temperature and at atmospheric pressure, thereby creating a plasma with a plasma temperature of at most 50° C.;
- wherein the plasma gas is ionized via a direct barrier discharge (DBD) by providing an AC voltage to create the DBD;
- b) introducing a precursor into a plasma gas afterglow of said plasma;
- c) subjecting the surface of the substrate to said plasma comprising said precursor, thereby forming a coating onto said surface,
- wherein said plasma gas is essentially completely comprised of inert gas, wherein the plasma gas is provided at a plasma gas flow of between 40 slpm to 90 slpm, and
- wherein said coating alters the adhesion properties of the surface of the substrate with respect to the second surface,
- wherein the substrate is not in a plasma zone and/or does not pass through a plasma zone, said plasma zone being a zone where plasma is induced,
- wherein the precursor comprises an isocyanate functional group.
A method for altering adhesion properties of a surface of a substrate with respect to a second surface by a coating, comprising the steps of:
- a) ionizing a plasma gas at low temperature and at atmospheric pressure, thereby creating a plasma with a plasma temperature of at most 50° C., wherein the plasma gas is ionized via a direct barrier discharge (DBD) by providing an AC voltage to create the DBD;
- b) introducing a precursor into a plasma gas afterglow of said plasma;
- c) subjecting the surface of the substrate to said plasma comprising said precursor, thereby forming a coating onto said surface,
- wherein said plasma gas is essentially completely comprised of inert gas, wherein the plasma gas is provided at a plasma gas flow of between 50 and 1500 slpm, and
- wherein said coating alters the adhesion properties of the surface of the substrate with respect to the second surface,
- wherein the substrate is not in a plasma zone and/or does not pass through a plasma zone, said plasma zone being a zone where plasma is induced.
Dependencies are inferred from the claim text.