Plasma uniformity control system using multi-pulsing and control method thereof
AssigneeKorea Atomic Energy Research Institute
InventorSung Ryul Huh
Life of this patent
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Abstract
A system for controlling plasma uniformity according to an embodiment includes a plasma generator configured to generate plasma by applying pulsed power to a plasma source gas, an ion supply unit connected to the plasma generator and configured to receive and accommodate the plasma generated by the plasma generator, a plurality of segmented electrodes positioned inside or below the ion supply unit and configured to be electrically isolated from each other and individually biased at voltages, and a controller configured to control the amount of supply of ions moving from the ion supply unit to the plurality of segmented electrodes.
Claims14
A system for controlling plasma uniformity, the system comprising:
- a plasma generator configured to generate plasma by applying pulsed power to a plasma source gas;
- an ion supply unit connected to the plasma generator and configured to receive and accommodate the plasma generated by the plasma generator;
- a plurality of segmented electrodes positioned inside or below the ion supply unit and configured to be electrically isolated from each other and individually biased at voltages;
- and
- a controller configured to control the amount of supply of ions moving from the ion supply unit to the plurality of segmented electrodes,
- wherein the plurality of segmented electrodes comprises a first segmented electrode and a second segmented electrode, the first segmented electrode is positioned to be closer to the plasma generator than the second segmented electrode, and
- wherein electric potential applied to the second segmented electrode is higher than electric potential applied to the first segmented electrode when the plasma generator is in an after-glow state.
A system for controlling plasma uniformity, the system comprising:
- a first plasma generator configured to generate first plasma by applying first pulsed power to a first plasma source gas;
- a second plasma generator configured to generate second plasma by applying second pulsed power, whose pulse has a phase difference with respect to the first pulsed power pulse, to a second plasma source gas;
- an ion supply unit positioned between the first plasma generator and the second plasma generator, connected to the first plasma generator and the second plasma generator, and configured to receive and accommodate the first plasma and the second plasma;
- a first segmented electrode configured to be biased at a first voltage;
- and
- a second segmented electrode configured to be biased at a second voltage, positioned to be farther from the first plasma generator than the first segmented electrode, and positioned to be closer to the second plasma generator than the first segmented electrode,
- wherein in an after-glow state of the first plasma generator, the first voltage is more negative with respect to the second voltage, and the second plasma generator is in an active-glow state.
A method of controlling plasma uniformity, the method comprising:
- measuring a distribution of an amount of ion supply or an amount of ion supply for each position in an ion supply unit or an ion processing unit corresponding to each segmented electrode at a specific time after plasma generated by a plasma generator is transported to the ion supply unit;
- applying, by a controller, voltages individually to a plurality of segmented electrodes that is electrically isolated from each other;
- and
- determining whether the distribution of the amount of ion supply or the amount of ion supply for each position in the ion supply unit or the ion processing unit at a specific time conforms to a user's design based on changes in voltages of the plurality of segmented electrodes.
Dependencies are inferred from the claim text.