Apparatus for inspecting droplet and substrate processing apparatus including the same
AssigneeSemes Co., Ltd.
InventorsYoung Jun Son, Young Un Yun, Sung Chul Jung
Life of this patent
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AssigneeSemes Co., Ltd.
InventorsYoung Jun Son, Young Un Yun, Sung Chul Jung
Estimating the term…
An apparatus for inspecting a chemical solution of the present invention comprises a base unit having an inlet, through which a chemical solution is introduced, a flow path unit, in which the chemical solution introduced through the inlet is moved while a velocity of its fluid is changed, and including a first region unit provided adjacent to the inlet of the base unit and a second region unit being in series communication with the first region unit, in which the chemical solution discharged from the first region unit is moved, a detecting unit including a first detecting member for detecting a first signal that is an electrical signal of the first region unit, and a second detecting member for detecting a second signal that is an electrical signal of the second region unit, and a determining unit for receiving a signal from the detecting unit and determining that a particle and a bubble are detected if a current of the first signal and the second signal is changed compared to a reference value, and discriminating and determining a particle and a bubble according to a difference in a current between the first signal and the second signal or a time difference, in which a current is changed.
An apparatus for inspecting a chemical solution comprising:
An apparatus for inspecting a chemical solution comprising:
Dependencies are inferred from the claim text.