Resist composition, method of forming resist pattern, and compound
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsKhanhTin Nguyen, Mari Murata, Masatoshi Arai, Nobuhiro Michibayashi
Life of this patent
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Abstract
A resist composition including a base material component (A) whose solubility in a developing solution is changed due to the action of an acid, and a compound (D0) formed of an anion moiety and a cation moiety which is represented by Formula (d0), in which the cation moiety of the compound (D0) has a Log P value of less than 7.7. In the formula, Mm+ represents an m-valent organic cation, Rd0 represents a substituent, p represents an integer of 0 to 3, q represents an integer of 0 to 3, n represents an integer of 2 or greater, and a relationship of “n+p≤(q×2)+5” is satisfied.
Claims3
A resist composition which generates an acid upon exposure and whose solubility in a developing solution is changed due to an action of the acid, the resist composition comprising:
- a base material component (A) whose solubility in a developing solution is changed due to the action of an acid;
- and
- a compound (DO) formed of an anion moiety and a cation moiety, which is represented by Formula (d0),
- wherein the cation moiety of the compound (DO) has a Log P value of less than 7.7,
- wherein Mm+ represents an m-valent organic cation represented by Formula (ca-d0), m represents 1, Rd0 represents a substituent, p represents an integer of 0 to 3, and in a case where p represents 2 or 3, a plurality of substituents as Rd0 may be the same as or different from one another, q represents an integer of 0 to 3, n represents an integer of 2 or greater, where a relationship of “n+p≤(q×2)+5” is satisfied,
- wherein Rd1 represents an aryl group which may have a substituent;
- and Rd2 and Rd3 each independently represent an aryl group which may have a substituent or may be bonded to each other to form a ring with a sulfur atom in Formula (ca-d0);
- provided that when any of Rd1, Rd2 and Rd3 has a substituent represented by any of Formula (ca-r-1) to (ca-r-7), R′201 in Formula (ca-r-1) to (ca-r-7) is a hydrogen atom, a chain-like alkyl group which may have a substituent, or a chain-like alkenyl group which may have a substituent,
A compound formed of an anion moiety and a cation moiety, which is represented by Formula (d0),
- wherein a Log P value of the cation moiety is less than 7.7,
- wherein Mm+ represents an m-valent organic cation represented by Formula (ca-d0), m represents 1, Rd0 represents a substituent, p represents an integer of 0 to 3, and in a case where p represents 2 or 3, a plurality of substituents as Rd0 may be the same as or different from one another, q represents an integer of 0 to 3, n represents an integer of 2 or greater, where a relationship of “n+p≤(q×2)+5” is satisfied,
- wherein Rd1 represents an aryl group which may have a substituent;
- and Rd2 and Rd3 each independently represent an aryl group which may have a substituent or may be bonded to each other to form a ring with a sulfur atom in Formula (ca-d0);
- provided that when any of Rd1, Rd2 and Rd3 has a substituent represented by any of Formula (ca-r-1) to (ca-r-7), R′201 in Formula (ca-r-1) to (ca-r-7) is a hydrogen atom, a chain-like alkyl group which may have a substituent, or a chain-like alkenyl group which may have a substituent,
Dependencies are inferred from the claim text.