Substrate processing apparatus

A substrate processing apparatus comprising:

• a bake chamber;
• a chamber door that opens and closes an opening of the bake chamber;
• a first support plate provided in the bake chamber;
• a heating unit, which is arranged in a first heat treatment space provided on the first support plate and comprises a first heating stage configured to heat a substrate and a first heating chamber accommodating the first heating stage;
• a first exhaust duct, which is connected to a first exhaust pipe connected to an upper side of the first heating chamber and discharges gas introduced through the first exhaust pipe to the outside;
• a second exhaust duct, which is provided on one side of the first exhaust duct and comprises a plurality of communicating holes that communicate between the first heat treatment space and an inner flow path provided in the second exhaust duct;
• a connection pipe, which extends between the second exhaust duct and the first heating chamber to communicate between the inner flow path of the second exhaust duct and a space in the first heating chamber;
• a sealing bracket, which is coupled to one side of the first exhaust duct facing the chamber door and extends in a direction in which the first exhaust duct extends;
• and
• a horizontal packing, which extends along the sealing bracket and is configured to seal a gap between the sealing bracket and the chamber door.

A substrate processing apparatus comprising:

• a bake chamber;
• a chamber door that opens and closes an opening of the bake chamber;
• a first support plate provided in the bake chamber;
• a first partition wall, which partitions a space provided on the first support plate into first heat treatment spaces spaced apart from each other in a first horizontal direction, and extends on the first support plate in a second horizontal direction and a vertical direction, wherein the second horizontal direction is perpendicular to the first horizontal direction, and the vertical direction is perpendicular to the first horizontal direction and the second horizontal direction;
• first heat treatment modules, which are arranged in the first heat treatment spaces, each of the first heat treatment modules comprising a first cooling stage configured to cool a substrate and a first heating stage configured to heat the substrate;
• a first exhaust duct extending in the first horizontal direction across the first heat treatment spaces and through which gas exhausted from the first heat treatment modules is introduced;
• a second exhaust duct, which extends in the first horizontal direction across the first heat treatment spaces and comprises a plurality of communicating holes that communicate between a flow path provided in the second exhaust duct and the first heat treatment spaces;
• a first sealing bracket, which is coupled to the first exhaust duct and extends in the first horizontal direction along the first exhaust duct;
• a first horizontal packing, which extends in the first horizontal direction along the first sealing bracket and is configured to seal a gap between the first sealing bracket and the chamber door;
• a first vertical packing, which extends in the vertical direction along an edge of the first partition wall facing the chamber door and is configured to seal a gap between the first partition wall and the chamber door;
• a second support plate provided below the first support plate;
• a second partition wall, which partitions a space provided between the first support plate and the second support plate into second heat treatment spaces spaced apart from each other in the first horizontal direction, and extends in the second horizontal direction and the vertical direction;
• second heat treatment modules, which are arranged in the second heat treatment spaces, each of the second heat treatment modules comprising a second cooling stage configured to cool a substrate and a second heating stage configured to heat the substrate;
• and
• a second vertical packing, which extends in the vertical direction along an edge of the second partition wall facing the chamber door and is configured to seal a gap between the second partition wall and the chamber door.