Composition for forming pattern, kit, pattern producing method, pattern, and method for manufacturing semiconductor element
AssigneeFUJIFILM Corporation
InventorsYuichiro Goto, Naoya Shimoju
Life of this patent
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Abstract
A composition for forming a pattern for imprinting, which contains a polymerizable compound, a photopolymerization initiator, and an organic halogen compound containing at least one atom selected from the group consisting of a chlorine atom, a bromine atom, and an iodine atom, in which the organic halogen compound is a compound which is stable to light of a mercury lamp, and a content of the organic halogen compound is 0.001% to 1.0% by mass with respect to a total solid content in the composition for forming a pattern; a kit including the composition for forming a pattern; a pattern producing method; a pattern; and a method for manufacturing a semiconductor element.
Claims15
A composition for forming a pattern for imprinting, comprising:
- a polymerizable compound;
- a photopolymerization initiator;
- and
- an organic halogen compound containing at least one atom selected from the group consisting of a chlorine atom, a bromine atom, and an iodine atom,
- wherein the polymerizable compound contains a partial structure obtained by removing a halogen atom from the organic halogen compound,
- the organic halogen compound is a compound which is stable to light of a mercury lamp, and
- a content of the organic halogen compound is 0.001% to 1.0% by mass with respect to a total solid content in the composition for forming a pattern,
- wherein a solvent other than water is not substantially contained in the composition for forming a pattern, and
- the composition for forming a pattern has a viscosity at 25° C. of 12 mPa·s or lower.
Dependencies are inferred from the claim text.