Logic gate device
AssigneesTsinghua University, Hon Hai Precision Industry Co., Ltd.
InventorsGuang-Qi Zhang, Yang Wei, Shou-Shan Fan
Life of this patent
Estimating the term…
Loading patent…
AssigneesTsinghua University, Hon Hai Precision Industry Co., Ltd.
InventorsGuang-Qi Zhang, Yang Wei, Shou-Shan Fan
Estimating the term…
The present application provides a logic gate device. The logic gate device includes a gate electrode, a gate insulating layer, a bottom electrode, a two-dimensional semiconductor layer, a first top electrode and a second electrode. The gate insulating layer is located on the gate electrode. The bottom electrode is located on the gate insulating layer. The two-dimensional semiconductor layer is located on the bottom electrode and simultaneously covers the gate insulating layer. The first top electrode and the second electrode are located on the two-dimensional semiconductor layer. The bottom electrode, the two-dimensional semiconductor layer and the gate insulating layer form an air gap, and the air gap is distributed at both sides of the bottom electrode. The gate electrode is configured to connect a gate voltage, and the first top electrode and the second top electrode are configured to connect a signal input terminal.
A logic gate device comprises:
Dependencies are inferred from the claim text.