Method of making mems microphone with an anchor
AssigneeSkyworks Solutions, Inc.
InventorsGuofeng Chen, Yu Hui
Life of this patent
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Abstract
A method for manufacturing a microelectromechanical systems (MEMS) microphone comprises depositing a membrane on a first sacrificial layer, wherein the first sacrificial layer is deposited on a substrate, etching the substrate to define a cavity, releasing the membrane by removing at least the first sacrificial layer, and forming at least one anchor at the edge of the membrane.
Claims21
A method for manufacturing a microelectromechanical systems (MEMS) microphone, comprising:
- depositing a membrane on a first sacrificial layer, wherein the first sacrificial layer is deposited on a substrate;
- etching the substrate to define a cavity;
- releasing the membrane by removing at least the first sacrificial layer;
- and
- forming at least one anchor at an edge of the membrane;
- depositing a second sacrificial layer on top of the deposited membrane, the first and second sacrificial layers forming a single sacrificial layer;
- dry etching the single sacrificial layer at the edge of the membrane;
- depositing a layer of polysilicon on the single sacrificial layer;
- and
- etching areas of the polysilicon layer such that there is at least one section of polysilicon layer remaining and at least one section of the single sacrificial layer is exposed.
A microelectromechanical systems (MEMS) microphone, comprising:
- a substrate including at least one wall defining a cavity;
- a membrane supported by the at least one wall;
- and
- at least one anchor in contact with the membrane and the at least one wall, such that the membrane is only fixed to the at least one wall by the at least one anchor, wherein the anchor is formed from metal.
A method for manufacturing a microelectromechanical systems (MEMS) microphone, comprising:
- depositing a membrane on a first sacrificial layer, wherein the first sacrificial layer is deposited on a substrate;
- etching the substrate to define a cavity;
- forming at least one anchor at an edge of the membrane;
- depositing a second layer of sacrificial layer on top of the deposited membrane, where the first and second sacrificial layers form a single sacrificial layer;
- dry etching the single sacrificial layer at the edge of the membrane to expose at least one section of the membrane;
- depositing a layer of polysilicon on the remaining single sacrificial layer;
- etching areas of the polysilicon layer such that there is at least one section of polysilicon layer remaining and at least one section of single sacrificial layer exposed;
- and
- removing the single sacrificial layer to release the membrane.
Dependencies are inferred from the claim text.