Method for birefringence patterning

A method, comprising:

• providing a radiation with a predetermined intensity variation;
• providing a stack of a photo-sensitive medium layer and an absorbing film, the absorbing film including an absorbing additive having a predetermined uniform distribution within a film plane of the absorbing film, wherein the predetermined uniform distribution of the absorbing additive is configured to result in a predetermined uniform absorption of the radiation;
• and
• exposing the stack of the photo-sensitive medium layer and the absorbing film to the radiation, wherein after being exposed to the radiation propagating through the absorbing film, the photo-sensitive medium layer forms a polymer film including at least one predetermined birefringence variation in at least one of a direction within a film plane or a thickness direction of the polymer film.

A method, comprising:

• providing a radiation with a uniform intensity;
• providing a stack of a photo-sensitive medium layer and an absorbing film, the absorbing film including an absorbing additive having a predetermined non-uniform distribution in one or more directions within a film plane of the absorbing film, wherein the predetermined non-uniform distribution of the absorbing additive is configured to result in a predetermined non-uniform absorption of the radiation;
• and
• exposing the stack of the photo-sensitive medium layer and the absorbing film to the radiation, wherein after being exposed to the radiation propagating through the absorbing film, the photo-sensitive medium layer forms a polymer film including one or more predetermined birefringence variations in one or more directions within a film plane of the polymer film.