Method for forming a layer of alumina at the surface of a metallic substrate
AssigneeSafran
InventorsMarjorie Christine Cavarroc, Stéphane Knittel, Jolenta Sapieha, Ludvik Martinu, Florence Bergeron, Simon Loquai
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Abstract
A method for forming a layer of alumina on the surface of a metal alloy substrate including aluminium, includes depositing a first aluminium layer on a surface of the metallic substrate, depositing a second layer by vapour-phase deposition on the first layer, the second layer comprising aluminium, a halogen and oxygen, and heat treatment of the substrate coated with the first and second layers under oxidising atmosphere in order to form the layer of alumina at the surface of the metallic substrate.
Claims9
A method for forming a layer of alumina on a surface of a metal alloy substrate comprising aluminium, the method comprising:
- depositing a first aluminium layer consisting of elemental aluminium on the surface of the metal alloy substrate wherein the metal alloy substrate is a titanium aluminide based alloy,
- depositing a second layer by vapour-phase deposition on the first aluminium layer, the second layer comprising aluminium, a halogen and oxygen wherein the second layer comprises in atomic percentages 55-65% halogen, 10-30% aluminum and 3-15% oxygen, the first and second layers being in direct contact, wherein the second layer is deposited from a gas phase comprising oxygen, a halogen gas and aluminium and wherein the second layer is deposited by sputtering of a target comprising aluminium in an atmosphere comprising oxygen and halogen gas, and
- heat treatment of the metal alloy substrate coated with the first and second layers under oxidising atmosphere in order to form the layer of alumina at the surface of the metal alloy substrate.
Dependencies are inferred from the claim text.