Laser processing device and laser light monitoring method
AssigneeJsw Aktina System Co., Ltd.
InventorsKenichi Ohmori, Suk-Hwan Chung, Ryosuke Sato, Yuzaburo Ota
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Abstract
A laser processing device and a laser processing method that are capable of forming a high-quality semiconductor film are provided. An ELA device (excimer laser annealing device) (1) includes a laser oscillator (10) that generates laser light for forming a polysilicon film by irradiating an amorphous silicon film over a substrate to be processed with the laser light, a pulse measuring instrument (100) for detecting first partial light and second partial light contained in the laser light, and a monitoring device (60) for comparing a detection result of the first partial light with a detection result of the second partial light.
Claims20
A laser processing device comprising:
- a laser generation device configured to generate laser light to be applied to an object to be processed;
- a photodetection device configured to detect a first partial light and a second partial light contained in the laser light;
- and
- a monitoring unit configured to generate a waveform for the first partial light and a waveform for the second partial light, and compare an area of the waveform of the first partial light with an area of the waveform of the second partial light.
A laser light monitoring method comprising:
- (A) generating laser light to be applied to an object to be processed;
- (B) detecting first partial light and second partial light contained in the laser light;
- and
- (C) generating a waveform for the first partial light and a waveform for the second partial light, and comparing an area of the waveform of the first partial light with an area of the waveform of the second partial light.
Dependencies are inferred from the claim text.