Method for activating an exposed layer
AssigneeCommissariat A L'energie Atomique Et Aux Energies Alternatives
InventorsPierre Brianceau, Nicolas Posseme
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Abstract
A method for activating an exposed layer of a structure including a provision of a structure including an exposed layer, a deposition of a layer based on a material of formula SiaYbXc, with X chosen from among fluorine F and chlorine Cl, and Y chosen from among oxygen O and nitrogen N, a, b and c being non-zero positive integers, a treatment of the layer SiaYbXc by an activation plasma based on at least one from among oxygen and nitrogen, the parameters of the deposition of the layer SiaYbXc being chosen so as to obtain a sufficiently low material density such that the layer SiaYbXc is at least partially consumed by the activation plasma.
Claims20
A method for activating an exposed layer of a structure, the method comprising:
- providing a structure comprising an exposed layer;
- depositing, on the exposed layer, a layer SiaYbXc, which is based on a material of formula SiaYbXc, with X chosen from among F and Cl, and Y chosen from among O and N, and a, b and c being non-zero positive integers;
- treating the layer SiaYbXc with an activation plasma based on at least one from among oxygen and nitrogen;
- and
- at least partially consuming the layer SiaYbXc by the activation plasma,
- wherein the parameters of the deposition of the layer SiaYbXc are chosen so as to obtain a sufficiently low material density such that the layer SiaYbXc is at least partially consumed by the activation plasma.
Dependencies are inferred from the claim text.